International Steering Committee

E. M. Bazizi

Applied Materials

USA

D. Esseni

University of Udine

Italy

F. Gamiz

University of Granada

Spain

Y. Kamakura

Osaka Institute of Technology

Japan

H. Minari

Sony Semiconductor Solutions Corporation

Japan

S. Souma

Kobe University

Japan

F. Triozon

CEA-Leti

France

W. G. Vandenberghe

University of Dallas

USA

     
     

Honorary Committee

R. Dutton

Stanford University

USA

S. Selberherr

TU Wien

Austria

K. Taniguchi

Osaka University

Japan